Nucleic Acids Research, Vol 27, Issue 15 3096-3103, Copyright © 1999 by Oxford University Press
S Kanno, S Iwai, M Takao and A Yasui
UV damage endonuclease (UVDE) initiates a novel form of excision repair by
introducing a nick imme-diately 5" to UV-induced cyclobutane pyrimidine
dimers or 6-4 photoproducts. Here, we report that apurinic/apyrimidinic
(AP) sites are also nicked by Neurospora crassa and Schizosaccharomyces
pombe UVDE. UVDE introduces a nick immediately 5" to the AP site leaving a
3"-OH and a 5"-phosphate AP. Apyrimidinic sites are more effectively nicked
by UVDE than apurinic sites. UVDE also possesses 3"-repair activities for
AP sites nicked by AP lyase and for 3"-phosphoglycolate produced by
bleomycin. The Uvde gene introduced into Escherichia coli cells lacking two
types of AP endonuclease, Exo III and Endo IV, gave the host cells
resistance to methylmethane sulfonate and t-butyl hydroperoxide. We
identified two AP endonuclease activities in S.pombe cell extracts. Besides
cyclobutane pyrimidine dimers and 6-4 photoproducts, N. crassa UVDE also
nicks Dewar photoproducts. Thus, UVDE is able to repair both of the major
forms of DNA damage in living organisms: UV-induced DNA lesions and AP
sites.
ARTICLES
Repair of apurinic/apyrimidinic sites by UV damage endonuclease; a repair protein for UV and oxidative damage
Department of Molecular Genetics, Institute of Development, Aging and Cancer, Tohoku University, Sendai 980-8575, Japan.
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